06
2021
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12
UPW Engineering Project of Shandong GRINM Semiconductor Materials Co., Ltd.
Author:
This project needs to meet the requirements of the UPW system required for the large-scale production of large-sized silicon materials for integrated circuits by Shandong GRINM Semiconductor Materials Co., Ltd. The large-scale production project of large-size silicon materials for integrated circuits is planned to cover an area of 330 mu, with a current construction area of about 100,000 square meters (considering the overall layout, an additional 100,000 square meters of building area will be reserved). The project constructs an 8-inch silicon wafer polishing line and a large-diameter silicon monocrystal production line and relocates the existing 6-inch and 8-inch silicon wafer polishing lines and large-diameter silicon monocrystal production lines from Beijing. Upon completion, the project will achieve a production capacity of 380,000 6-inch and 8-inch wafers per month and 25 tons of large-diameter silicon monocrystals per month.
UPW system for the Shandong GRINM Integrated Circuit Large-scale Silicon Material Production Project
Shandong GRINM Semiconductor Materials Co., Ltd. (hereinafter referred to as "GRINM") was established in June 2001. GRINM is a national high-tech enterprise located in the Zhongguancun Science Park in Beijing, a hub for high-tech industries. It possesses a comprehensive set of core technologies with independent intellectual property rights and has advanced manufacturing facilities that comply with international standards. The Company is currently mainly engaged in the research, development, production, and operation of silicon materials, providing related technology development, technology transfer, and technology consulting services. The main products include 5-12 inch silicon single crystals and wafers for integrated circuits, 5-8 inch silicon wafers for power integrated circuits, 3-6 inch zone melting silicon single crystals and wafers, ultra-large diameter silicon single crystals and silicon components for integrated circuit process equipment, etc. The products can be applied in multiple fields such as integrated circuits, power devices, solar energy, etc., and are exported to multiple regions including the United States, Japan, South Korea, Taiwan, etc., with high popularity and influence in domestic and foreign markets.
This project needs to meet the requirements of the pure water system required for the large-scale production of large-sized silicon materials for integrated circuits by Shandong GRINM Semiconductor Materials Co., Ltd. The large-scale production project of large-size silicon materials for integrated circuits is planned to cover an area of 330 mu, with a current construction area of about 100,000 square meters (considering the overall layout, an additional 100,000 square meters of building area will be reserved). The project constructs an 8-inch silicon wafer polishing line and a large-diameter silicon monocrystal production line and relocates the existing 6-inch and 8-inch silicon wafer polishing lines and large-diameter silicon monocrystal production lines from Beijing. Upon completion, the project will achieve a production capacity of 380,000 6-inch and 8-inch wafers per month and 25 tons of large-diameter silicon monocrystals per month.
1. Treatment scale:
4,230 m³/d
2. Main process:
UPW process: pre-treatment system, double reverse osmosis (DRO) system, softened water treatment system, UPW polishing system.
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