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High-frequency technology is equipped with an ultra-pure and stable distribution system that effectively inhibits the precipitation of impurities such as organic substances and ions, ensuring a 24-hour uninterrupted circulating supply to guarantee the quality of process water.
The ultrapure water, after being processed by each unit in the ultrapure water preparation system, is transported via supply and return pipelines to near-process equipment in various areas of the semiconductor cleanroom. Depending on the water consumption requirements of the process equipment, valves of appropriate sizes are pre-installed near the equipment. Before connecting to the process equipment, the supply and return valves are linked together through pipelines to prevent stagnant water. When the equipment is not in use, the ultrapure water flows back through the return pipeline to the pure water tank, where it circulates continuously within the pipeline for 24 hours without interruption.
To ensure constant pressure within the pipeline and meet the water demand of the process equipment, when the water consumption of the process equipment fluctuates, the pressure in the pipeline is maintained constant by means of variable-frequency control of the booster pump and adjustment of the opening degree of the proportional control valve located at the return-water pipeline. The supply flow rate typically exceeds the water consumption by 20% to 50%, ensuring that, during periods of high water usage by the process equipment, the return-water pipeline will not experience bacterial growth due to excessively low water velocity within the pipeline.
The pipelines in the delivery system must exhibit extremely high stability, with virtually no precipitation of impurities such as organic matter or ions, ensuring that ultrapure water is supplied to the equipment end without contamination.

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